PATENT

Powered by:

METHOD FOR ARRANGING MICROPARTICLES ON LARGE-AREA SUBSTRATE AND POLYMER COMPOSITE COMPRISING MICROPARTICLES ARRANGED THEREBY

The present invention relates to a method for arranging microparticles on a large-area substrate and a polymer composite prepared thereby, the method comprising: (a) a step of providing a substrate; (b) a step of forming a coating layer by coating a mixture comprising a photocurable polymer precursor onto the substrate; (c) a step of photocuring the coating layer by covering the coating layer with a mask having a pattern of empty spaces and filled parts, and irradiating light thereto; (d) a step of preparing a patterned polymer film comprising holes formed by debossing or embossing and a support between the holes, by washing the photocured coating layer; and (e) a step of arranging microparticles on a large-area substrate, in which a polymer composite having microparticles placed in the holes is prepared by placing microparticles in the holes of the patterned polymer film. The present invention enables a large amount of microparticles to be easily and quickly arranged in desired positions on a large-area substrate.


» Number: WO2019017576A1 (A1)

» Publication Date: 19//2/24/0

» Applicant: POSTECH ACADEMY IND FOUNDATION?[KR]

» Inventor: JEONG UNYONG?[KR]; YOU INSANG?[KR]

» More Information

« Go to Technological Watch





This project has received funding from the European Union Seventh Framework Programme (FP7/2007-2013) under grant agreement n° [609149].

AIMPLAS - Instituto Tecnológico del Plástico | C/ Gustave Eiffel, 4 (Valčncia Parc Tecnolňgic) | 46980 - PATERNA (Valencia) - SPAIN                Powered by: SoftVT